Vol. 14 No. 5
Special Issue on New Materials for Sensors
Guest Editor: Makoto Ishida (Toyohashi University of Technology)
S&M485Research Paper of Special Issue |
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S&M485 Characteristics of Plasmaless Dry Etching of Silicon-Related Materials Using Chlorine Trifluoride Gas Yoji Saito |
S&M486Research Paper of Special Issue |
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S&M486 Silicon Dioxide Micropillars for Sieving Fabricated by Macroporous Silicon-Based Micromachining Shinichi Izuo, Hiroshi Ohji, Patrick J. French, Kazuhiko Tsutsumi and Masafumi Kimata |
S&M487Research Paper of Special Issue |
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S&M487 High-Sensitivity Hybrid Hall Effect ICs with Thin Film Hall Elements Kazutoshi Ishibashi, Ichiro Okada and Ichiro Shibasaki |
S&M488Research Paper of Special Issue |
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S&M488 Heteroepitaxial Growth of GaN on γ-Al2O3/Si Substrate by Organometallic Vapor Phase Epitaxy Akihiro Wakahara, Nobuharu Kawamura, Hiroshi Oishi, Hiroshi Okada, Akira Yoshida and Makoto Ishida |
S&M489Research Paper of Special Issue |
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S&M489 Growth-Mode Control in Sublimation Epitaxy of AlN Tomoaki Furusho and Shigehiro Nishino |
S&M490Research Paper of Special Issue |
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S&M490 Influence of Initial Layers on Crystallinity of NiO(111) Epitaxial Film Grown at Room Temperature by Pulsed Laser Deposition Yoshiharu Kakehi, Satoru Nakao, Kazuo Satoh and Tadaoki Kusaka |
Cover of this Issue |
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