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Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials
is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
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Sensors and Materials
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is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
Instructions to authors
English 日本語
Instructions for manuscript preparation
English 日本語
Template
English
Publisher
MYU K.K.
Sensors and Materials
1-23-3-303 Sendagi,
Bunkyo-ku, Tokyo 113-0022, Japan
Tel: 81-3-3827-8549
Fax: 81-3-3827-8547
MYU Research, a scientific publisher, seeks a native English-speaking proofreader with a scientific background. B.Sc. or higher degree is desirable. In-office position; work hours negotiable. Call 03-3827-8549 for further information.
MYU Research
(proofreading and recording)
MYU K.K.
(translation service)
The Art of Writing Scientific Papers
(How to write scientific papers)
(Japanese Only)
Sensors and Materials, Volume 14, Number 8 (2002)
Copyright(C) MYU K.K.
Copyright(C) MYU K.K.
|
pp. 415-428
S&M501 Research Paper Published: 2002 Temperature Dependent Etching of (100) and (110) Silicon in NaOH and in Tetramethyl-Ammonium Hydroxide [PDF] Vladimir F. Kleptsyn and Johannes G. Smits Keywords: silicon, wet etching, sodium hydroxide, tetramethyl ammonium hydroxide
The etch rates for single crystal silicon wafers in NaOH and tetramethyl-ammonium hydroxide (TMAH) have been measured in the temperature range from 28℃ to 80℃ and activation energies of about 0.68 and 0.57 eV for NaOH and TMAH respectively for the (100) plane are observed. A qualitative model of the etching of silicon planes in NaOH and TMAH is presented.
 Cite this article Vladimir F. Kleptsyn and Johannes G. Smits, Temperature Dependent Etching of (100) and (110) Silicon in NaOH and in Tetramethyl-Ammonium Hydroxide, Sens. Mater., Vol. 14, No. 8, 2002, p. 415-428. |
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