S&M594 Research Paper of Special Issue
Fabrication of 100-nm-Scale Nickel Stamper Based on Chrome/Quartz Mask without Anti-Reflection Layer [PDF]
Young Ho Seo, Doo-Sun Choi, Yeong-Eun Yoo, Joon-Hyoung Lee, Tae-Jin Je and Kyung-Hyun Whang
(Received April 10, 2004; Accepted December 20, 2004)
Keywords: nickel stamper, e-beam lithography, injection molding, 100-nm-scale stamper
We present a fabrication method for a high-aspect-ratio 100-nm-scale nickel stamper using e-beam writing on a chrome/quartz mask for the injection molding of optical grating patterns. We suggest a new fabrication process for a 100-nm-scale nickel stamper which uses a chrome layer on a blank mask as a seed layer for the nickel electroplating process. A conventional blank mask consists of layers in the order of Photoresist (PR), CrON and Cr on a quartz substrate (PR/CrON/Cr/Qz). We have prepared a blank mask without an antireflection layer of CrON, which is a nonconductive material, in order to use the chrome layer as a seed layer for the electroplating process. In PR mold fabrication, we have determined an optimum e-beam dosage of 10 C/cm2 for the PR/CrON/Cr/Qz mask, and one of 8.5 C/cm2 for the PR/Cr/Qz mask. The fabricated PR mold on the PR/CrON/Cr/Qz mask showed a minimum line width of 84 nm and the PR mold on the PR/Cr/Qz mask showed one of 96 nm with a height of 30010 nm. We have deposited additional seed layer materials of Ni as thick as 100 nm due to the high electric resistance of the Cr layer of 100 . After the nickel electroplating process, the total thickness of the fabricated nickel stamper was approximately 33020 m. The minimum width and height of the fabricated nickel line were measured as 1166 nm and 24020 nm, respectively. Consequently, we have fabricated a 2.5-AR (Aspect Ratio) nickel stamper with a minimum width of 1166 nm. The fabricated 100-nm-scale nickel stamper showed a maximum error of 20 nm compared with the PR mold.Corresponding author: Young Ho Seo
Cite this article
Young Ho Seo, Doo-Sun Choi, Yeong-Eun Yoo, Joon-Hyoung Lee, Tae-Jin Je and Kyung-Hyun Whang, Fabrication of 100-nm-Scale Nickel Stamper Based on Chrome/Quartz Mask without Anti-Reflection Layer, Sens. Mater., Vol. 17, No. 3, 2005, p. 155-165.