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Sensors and Materials
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Sensors and Materials, Volume 17, Number 3 (2005)
Copyright(C) MYU K.K.
pp. 155-165
S&M594 Research Paper of Special Issue
Published: 2005

Fabrication of 100-nm-Scale Nickel Stamper Based on Chrome/Quartz Mask without Anti-Reflection Layer [PDF]

Young Ho Seo, Doo-Sun Choi, Yeong-Eun Yoo, Joon-Hyoung Lee, Tae-Jin Je and Kyung-Hyun Whang

(Received April 10, 2004; Accepted December 20, 2004)

Keywords: nickel stamper, e-beam lithography, injection molding, 100-nm-scale stamper

We present a fabrication method for a high-aspect-ratio 100-nm-scale nickel stamper using e-beam writing on a chrome/quartz mask for the injection molding of optical grating patterns. We suggest a new fabrication process for a 100-nm-scale nickel stamper which uses a chrome layer on a blank mask as a seed layer for the nickel electroplating process. A conventional blank mask consists of layers in the order of Photoresist (PR), CrON and Cr on a quartz substrate (PR/CrON/Cr/Qz). We have prepared a blank mask without an antireflection layer of CrON, which is a nonconductive material, in order to use the chrome layer as a seed layer for the electroplating process. In PR mold fabrication, we have determined an optimum e-beam dosage of 10 C/cm2 for the PR/CrON/Cr/Qz mask, and one of 8.5 C/cm2 for the PR/Cr/Qz mask. The fabricated PR mold on the PR/CrON/Cr/Qz mask showed a minimum line width of 84 nm and the PR mold on the PR/Cr/Qz mask showed one of 96 nm with a height of 30010 nm. We have deposited additional seed layer materials of Ni as thick as 100 nm due to the high electric resistance of the Cr layer of 100 . After the nickel electroplating process, the total thickness of the fabricated nickel stamper was approximately 33020 m. The minimum width and height of the fabricated nickel line were measured as 1166 nm and 24020 nm, respectively. Consequently, we have fabricated a 2.5-AR (Aspect Ratio) nickel stamper with a minimum width of 1166 nm. The fabricated 100-nm-scale nickel stamper showed a maximum error of 20 nm compared with the PR mold.

Corresponding author: Young Ho Seo


Cite this article
Young Ho Seo, Doo-Sun Choi, Yeong-Eun Yoo, Joon-Hyoung Lee, Tae-Jin Je and Kyung-Hyun Whang, Fabrication of 100-nm-Scale Nickel Stamper Based on Chrome/Quartz Mask without Anti-Reflection Layer, Sens. Mater., Vol. 17, No. 3, 2005, p. 155-165.



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