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Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials
is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
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Sensors and Materials
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is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
Instructions to authors
English 日本語
Instructions for manuscript preparation
English 日本語
Template
English
Publisher
MYU K.K.
Sensors and Materials
1-23-3-303 Sendagi,
Bunkyo-ku, Tokyo 113-0022, Japan
Tel: 81-3-3827-8549
Fax: 81-3-3827-8547
MYU Research, a scientific publisher, seeks a native English-speaking proofreader with a scientific background. B.Sc. or higher degree is desirable. In-office position; work hours negotiable. Call 03-3827-8549 for further information.
MYU Research
(proofreading and recording)
MYU K.K.
(translation service)
The Art of Writing Scientific Papers
(How to write scientific papers)
(Japanese Only)
Sensors and Materials, Volume 17, Number 4 (2005)
Copyright(C) MYU K.K.
Copyright(C) MYU K.K.
|
pp. 179-186
S&M596 Research Paper of Special Issue Published: 2005 Characterization of Orientation-Dependent Etching Properties of Quartz: Application to 3-D Micromachining Simulation System [PDF] Di Cheng, Kazuo Sato, Mitsuhiro Shikida, Atsushi Ono, Kenji Sato, Kazuo Asaumi and Yasuroh Iriye (Received Ocober 1, 2004; Accepted March 17, 2005) Keywords: anisotropic etching, orientation dependence, ammonium bifluoride, single-crystal alpha-quartz
Novel characterization results of anisotropic etching properties of single-crystal alpha- quartz for a number of orientations using a spherical specimen are reported. The dimen- sions of the specimen’s surface were measured before and after etching, and the changes were used to calculate the etching rates for a single etching operation for a number of orientations. The etching rates were high at the Z-axis, but not the highest. Low etching rates, sometimes close to zero, were measured for directions perpendicular to the Z-axis. We first report the etching rate distribution perpendicular to the Z-axis. The estimated etching rates further allow us to simulate complete three-dimensional etching for arbi- trarily oriented quartz wafers.
Corresponding author: Di Cheng Cite this article Di Cheng, Kazuo Sato, Mitsuhiro Shikida, Atsushi Ono, Kenji Sato, Kazuo Asaumi and Yasuroh Iriye, Characterization of Orientation-Dependent Etching Properties of Quartz: Application to 3-D Micromachining Simulation System, Sens. Mater., Vol. 17, No. 4, 2005, p. 179-186. |
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Hirotaka Takizawa, Masatoshi Minamisawa, Hirohiko Motoki, Koichiro Kuwahara, and Masaki Yamaguchi
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