pp. 129-134
S&M1479 Research Paper https://doi.org/10.18494/SAM.2018.1643 Published: January 12, 2018 Complementary Metal Oxide Semiconductor Image Sensor Using Gate/Body-tied P-channel Metal Oxide Semiconductor Field Effect Transistor-type Photodetector for High-speed Binary Operation [PDF] Byoung-Soo Choi, Sang-Hwan Kim, Jimin Lee, Chang-Woo Oh, Sang-Ho Seo, and Jang-Kyoo Shin (Received June 1, 2017; Accepted August 22, 2017) Keywords: CMOS, image sensor, binary operation, gate/body-tied PMOSFET, photodetector
In this paper, we propose a CMOS image sensor that uses a gate/body-tied p-chnnel metal oxide semiconductor field effect transistor (PMOSFET)-type photodetector for highspeed binary operation. The sensitivity of the gate/body-tied PMOSFET-type photodetector is approximately six times that of the p–n junction photodetector for the same area. Thus, an active pixel sensor with a highly sensitive gate/body-tied PMOSFET-type photodetector is more appropriate for high-speed binary operation. Moreover, the CMOS image sensor for binary operation has the advantages of low power consumption and a simple circuit because an analogto- digital converter is not necessary. The proposed image sensor was fabricated and measured using a CMOS 0.35 µm conventional process.
Corresponding author: Jang-Kyoo ShinCite this article Byoung-Soo Choi, Sang-Hwan Kim, Jimin Lee, Chang-Woo Oh, Sang-Ho Seo, and Jang-Kyoo Shin, Complementary Metal Oxide Semiconductor Image Sensor Using Gate/Body-tied P-channel Metal Oxide Semiconductor Field Effect Transistor-type Photodetector for High-speed Binary Operation, Sens. Mater., Vol. 30, No. 1, 2018, p. 129-134. |