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Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials
is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
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Sensors and Materials
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is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
Instructions to authors
English 日本語
Instructions for manuscript preparation
English 日本語
Template
English
Publisher
MYU K.K.
Sensors and Materials
1-23-3-303 Sendagi,
Bunkyo-ku, Tokyo 113-0022, Japan
Tel: 81-3-3827-8549
Fax: 81-3-3827-8547
MYU Research, a scientific publisher, seeks a native English-speaking proofreader with a scientific background. B.Sc. or higher degree is desirable. In-office position; work hours negotiable. Call 03-3827-8549 for further information.
MYU Research
(proofreading and recording)
MYU K.K.
(translation service)
The Art of Writing Scientific Papers
(How to write scientific papers)
(Japanese Only)
Sensors and Materials, Volume 32, Number 7(3) (2020)
Copyright(C) MYU K.K.
Copyright(C) MYU K.K.
|
pp. 2433-2441
S&M2272 Research Paper of Special Issue https://doi.org/10.18494/SAM.2020.2889 Published: July 31, 2020 Fabrication and Thermoelectric Properties of Chromium Silicide Thin Films [PDF] Takao Mori, Takashi Aizawa, S. N. Vijayaraghavan, and Naoki Sato (Received March 30, 2020; Accepted May 15, 2020) Keywords: thermoelectric, thin film, magnetic semiconductor, power factor, thermal conductivity
Thermoelectric thin films are candidate materials that can be used to supply the energy harvested to autonomously power Internet of Things (IoT) sensors and devices. This work deals with the fabrication of chromium silicide thin films and the characterization of their thermoelectric properties. The films were grown by utilizing a high-temperature molecular beam epitaxy (MBE) apparatus under different conditions. The highest power factor of more than 0.6 mW/m K2 was obtained for the chromium silicide film deposited at a temperature of 900 °C. The thermal conductivity of the thin film was observed to be approximately one-third that of bulk CrSi2.
Corresponding author: Takao Mori  This work is licensed under a Creative Commons Attribution 4.0 International License. Cite this article Takao Mori, Takashi Aizawa, S. N. Vijayaraghavan, and Naoki Sato, Fabrication and Thermoelectric Properties of Chromium Silicide Thin Films, Sens. Mater., Vol. 32, No. 7, 2020, p. 2433-2441. |
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