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S&M3060 Research Paper of Special Issue https://doi.org/10.18494/SAM4041 Published: September 27, 2022 Study of Nd(Zn0.5Ti0.5)O3 Dielectric Thin Films Fabricated Using Sol–Gel Method [PDF] Ching-Fang Tseng, Bo-Yan Huang, and Cheng-Hsing Hsu (Received March 1, 2022; Accepted September 15, 2022) Keywords: sol–gel method, Nd(Zn0.5Ti0.5)O3 thin film, microstructure, electrical properties
We investigated the microstructures and electrical properties of Nd(Zn0.5Ti0.5)O3 thin films fabricated using the sol-gel method at various preheating temperatures and annealing temperatures. The composites and their morphological characteristics were analyzed using X-ray diffraction (XRD) and scanning electron microscopy (SEM) and were found to be sensitive to both the preheating temperature (100–300 ℃) and annealing temperature (600–800 ℃). The diffraction pattern indicated that the deposited films exhibit a polycrystalline microstructure. The dielectric constant and leakage current density of the Nd(Zn0.5Ti0.5)O3 thin films at a preheating temperature of 300 ℃ and an annealing temperature of 700 oC were 16 and 2.13 × 10−8, respectively. The experimental data for Nd(Zn0.5Ti0.5)O3 thin films can be applied to wireless communication microwave components, such as temperature-sensing antennas.
Corresponding author: Cheng-Hsing HsuThis work is licensed under a Creative Commons Attribution 4.0 International License. Cite this article Ching-Fang Tseng, Bo-Yan Huang, and Cheng-Hsing Hsu, Study of Nd(Zn0.5Ti0.5)O3 Dielectric Thin Films Fabricated Using Sol–Gel Method, Sens. Mater., Vol. 34, No. 9, 2022, p. 3561-3567. |