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Notice of retraction
Vol. 34, No. 8(3), S&M3042

Notice of retraction
Vol. 32, No. 8(2), S&M2292

Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials, Volume 36, Number 4(1) (2024)
Copyright(C) MYU K.K.
pp. 1319-1328
S&M3600 Research Paper
https://doi.org/10.18494/SAM4829
Published: April 9, 2024

Microfabrication of Si by KOH Etchant Using Etching Masks Amorphized by Ion Beam Extracted From Electron Cyclotron Plasma [PDF]

Mina Sato, Mie Tohnishi, and Akihiro Matsutani

(Received December 22, 2023; Accepted February 2, 2024)

Keywords: Si, KOH, ion beam, amorphous, microfabrication

We demonstrated KOH etching with an etching mask amorphized by ion irradiation. Amorphized masks were prepared by irradiating ion species (Ar+, Kr+, Xe+, N+, O+) at an ion energy of 500 eV with an electron cyclotron resonance ion shower system. The parameters for KOH etching were also studied. In addition, we fabricated structures with an aspect ratio of over 3000 and microfluidic devices using the proposed microfabrication technique. This technique is expected to be useful for the microfabrication of Si structures.

Corresponding author: Mina Sato


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Cite this article
Mina Sato, Mie Tohnishi, and Akihiro Matsutani, Microfabrication of Si by KOH Etchant Using Etching Masks Amorphized by Ion Beam Extracted From Electron Cyclotron Plasma, Sens. Mater., Vol. 36, No. 4, 2024, p. 1319-1328.



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