pp. 2501-2506
S&M4069 Research Paper of Special Issue https://doi.org/10.18494/SAM5559 Published: June 25, 2025 Microstructure and Electrical Characteristics of NbMoTaW Thin Films [PDF] Cheng-Hsing Hsu, Yu-Hao Hsu, and Chuan-Feng Shih (Received January 5, 2025; Accepted May 19, 2025) Keywords: high-entropy alloy, RF magnetron sputtering, electrical properties
We investigated the electrical properties and microstructures of high-entropy alloy NbMoTaW thin films prepared by radio frequency (RF) magnetron sputtering at different RF powers and substrate temperatures. Diffraction patterns indicated that the deposited films had a polycrystalline microstructure, and scanning electron microscopy results revealed that grain size was dependent on RF power and substrate temperature. The effects of processing parameters on the microstructure and electrical characteristics of the films were also investigated. The NbMoTaW alloy films are suitable for use as an electrode in sensors.
Corresponding author: Cheng-Hsing Hsu![]() ![]() This work is licensed under a Creative Commons Attribution 4.0 International License. Cite this article Cheng-Hsing Hsu, Yu-Hao Hsu, and Chuan-Feng Shih, Microstructure and Electrical Characteristics of NbMoTaW Thin Films, Sens. Mater., Vol. 37, No. 6, 2025, p. 2501-2506. |