pp. 435-448
S&M857 Research Paper of Special Issue https://doi.org/10.18494/SAM.2011.767 Published: October 20, 2011 Design of Optical System for Electrostatic Field Distribution Measurement Using Micromirror Array [PDF] Toshihide Kuriyama, Toshikazu Aoi, Hiroshi Maeda, Takaki Itoh, Yoshifumi Ueno, Toshiyuki Nakaie, Nobutika Matsui and Hiroyuki Okumura (Received May 2, 2011; Accepted June 20, 2011) Keywords: micromirror, electrostatic field distribution, optical system
An optical system for electrostatic field distribution measurement using a micromirror array fabricated by a micro-electromechanical systems (MEMS) process has been designed. Each micromirror is suspended by two thin torsion bars, which is made by a silicon-on-insulator (SOI) wafer fabrication process. The deflection of each mirror by an electrostatic field is measured optically using a two-dimensional optical scanner and a position-sensitive detector (PSD). Another optical system for increasing the sensitivity has also been proposed, which will widen the voltage measurement range. The electrostatic field distribution measurement system was applied to a human body model, and the removal effect of electricity was tested using removing tools.
Corresponding author: Toshihide KuriyamaCite this article Toshihide Kuriyama, Toshikazu Aoi, Hiroshi Maeda, Takaki Itoh, Yoshifumi Ueno, Toshiyuki Nakaie, Nobutika Matsui and Hiroyuki Okumura, Design of Optical System for Electrostatic Field Distribution Measurement Using Micromirror Array, Sens. Mater., Vol. 23, No. 7, 2011, p. 435-448. |