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Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials
is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
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Sensors and Materials
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is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
Instructions to authors
English 日本語
Instructions for manuscript preparation
English 日本語
Template
English
Publisher
MYU K.K.
Sensors and Materials
1-23-3-303 Sendagi,
Bunkyo-ku, Tokyo 113-0022, Japan
Tel: 81-3-3827-8549
Fax: 81-3-3827-8547
MYU Research, a scientific publisher, seeks a native English-speaking proofreader with a scientific background. B.Sc. or higher degree is desirable. In-office position; work hours negotiable. Call 03-3827-8549 for further information.
MYU Research
(proofreading and recording)
MYU K.K.
(translation service)
The Art of Writing Scientific Papers
(How to write scientific papers)
(Japanese Only)
Sensors and Materials, Volume 15, Number 1 (2003)
Copyright(C) MYU K.K.
Copyright(C) MYU K.K.
|
pp. 43-51
S&M508 Research Paper of Special Issue Published: 2003 Effects of ppb-Level Metal Impurities in Aqueous Potassium Hydroxide Solution on the Etching of Si{110} and {100} [PDF] Hiroshi Tanaka, Yoshitsugu Abe, Kazuyuki Inoue, Mitsuhiro Shikida and Kazuo Sato (Received October 1, 2002; Accepted January 30, 2003) Keywords: silicon, wet etching, KOH solution, metal impurities, etch rate, surface roughness
We investigated the etching characteristics of Si{110} and Si{100} planes in KOH solutions containing ppb-levels of the metal impurities, Ag, Al, Cr, Cu, Pb, Fe, Ni and Zn. It is found that the ppb-level of Cu in aqueous potassium hydroxide solution roughens both the Si{110} and {100} surfaces and the etch rate of Si{110} and {100} planes is affected by the ppb-level of Cu and Pb in KOH solutions. One can recognize no particular changes of etching characteristics in KOH solution containing ppb-levels of Ag, Al, Cr, Fe, Ni and Zn. The effects of Cu and Pb can be qualitatively explained by the interaction between metal ions and hydrogen gas generated during etching on the basis of oxidation-reduction potentials.
 Cite this article Hiroshi Tanaka, Yoshitsugu Abe, Kazuyuki Inoue, Mitsuhiro Shikida and Kazuo Sato, Effects of ppb-Level Metal Impurities in Aqueous Potassium Hydroxide Solution on the Etching of Si{110} and {100}, Sens. Mater., Vol. 15, No. 1, 2003, p. 43-51. |
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