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Vol. 32, No. 8(2), S&M2292

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Sensors and Materials, Volume 35, Number 6(2) (2023)
Copyright(C) MYU K.K.
pp. 1995-2011
S&M3303 Research Paper of Special Issue
https://doi.org/10.18494/SAM4351
Published: June 27, 2023

UV-curable Polydimethylsiloxane Photolithography and Its Application to Flexible Mechanical Metamaterials [PDF]

Ten Sekiguchi, Hidetaka Ueno, Vivek Anand Menon, Ryo Ichige, Yuya Tanaka, Hiroshi Toshiyoshi, and Takaaki Suzuki

(Received February 13, 2023; Accepted June 19, 2023)

Keywords: UV-PDMS, photolithography, polydimethylsiloxane, mechanical metamaterial, backside exposure

Polymers are increasingly being used as flexible structural materials in MEMS. We have focused on UV-cured polydimethylsiloxane (UV-PDMS), which is both photoreactive and highly flexible. In this study, we propose a photolithography-based patterning method to enable the microfabrication of UV-PDMS. The processing conditions related to patterning accuracy were also investigated. Furthermore, as a demonstration of the practical advantages of this processing method, free-standing flexible metamaterials with a negative Poisson’s ratio were fabricated and uniaxial tensile tests were performed. The results showed a minimum Poisson’s ratio of -1.30. Compared with the same type of specimen fabricated with a common permanent structural photoresist, the UV-PDMS specimen exhibited deformation approximately 12 times larger.

Corresponding author: Takaaki Suzuki


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Cite this article
Ten Sekiguchi, Hidetaka Ueno, Vivek Anand Menon, Ryo Ichige, Yuya Tanaka, Hiroshi Toshiyoshi, and Takaaki Suzuki, UV-curable Polydimethylsiloxane Photolithography and Its Application to Flexible Mechanical Metamaterials, Sens. Mater., Vol. 35, No. 6, 2023, p. 1995-2011.



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