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Vol. 34, No. 8(3), S&M3042

Notice of retraction
Vol. 32, No. 8(2), S&M2292

Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
Sensors and Materials
is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.

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Sensors and Materials, Volume 21, Number 6 (2009)
Copyright(C) MYU K.K.
pp. 315-319
S&M771 Short Notes
https://doi.org/10.18494/SAM.2009.583
Published: September 30, 2009

Fabrication of Buried Nanochannels by Transferring Metal Nanowire Patterns [PDF]

Daniel S. Choi and Eui-Hyeok Yang

(Received December 8, 2008; Accepted June 10, 2009)

Keywords: nanochannel, pattern transfer, metal nanowire, oxide nanowire, focused ion beam, FIB milling

A method of fabricating channels with widths of 30–50 nm in silicon substrates with channels buried under overlying layers of dielectric materials has been demonstrated. Buried nanochannels with an opening size of 20×80 nm2 have been successfully fabricated on a silicon wafer by transferring metal nanowire patterns. With further refinement, the method might be useful for fabricating nanochannels for the manipulation and analysis of large biomolecules at single-molecule resolution.

Corresponding author: Daniel S. Choi


Cite this article
Daniel S. Choi and Eui-Hyeok Yang, Fabrication of Buried Nanochannels by Transferring Metal Nanowire Patterns, Sens. Mater., Vol. 21, No. 6, 2009, p. 315-319.



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