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pp. 3301-3314
S&M4504 Technical paper https://doi.org/10.18494/SAM6178 Published: June 18, 2026 Optical Nondestructive Metrology of High-aspect-ratio Micro-holes via Focus-displacement Mapping [PDF] Birui Wu, Wenle Lan, Ying Chen, Lifeng Wang, and Guoxiang Liang (Received January 19, 2026; Accepted May 28, 2026) Keywords: aspect ratio, nondestructive measurement, OV7725 CMOS, STM32H743, shape from focus
The accurate and efficient metrology of micro-holes with aspect ratios from 5:1 to 20:1 remains challenging owing to low throughput and a high risk of damage in conventional approaches. Here, we develop an embedded optical, nondestructive measurement system that exploits a focus-displacement mapping mechanism to quantify key geometric parameters of high-aspect-ratio micro-holes. We introduce a gradient-variance-driven adaptive sharpness operator (GDANS) and a three-point parabolic interpolation scheme to rapidly locate focal planes with subpixel precision. In addition, a lightweight random sample consensus (RANSAC)-based circle fitting routine is employed to extract diameter and circularity with high efficiency. The system is built around an STM32H743 microcontroller and integrates an OV7725 CMOS image sensor, a quasi-coaxial illumination path, and a high-precision geared motor module through a modular opto-mechatronic design. A state-machine-based software architecture enables closed-loop operation from autofocus scanning to parameter reporting. Experiments on calibrated samples demonstrate favorable performance in measurement speed, cost, and practical deployability, providing a feasible solution for the rapid on-site inspection of high-aspect-ratio micro-holes in industrial settings.
Corresponding author: Birui Wu![]() ![]() This work is licensed under a Creative Commons Attribution 4.0 International License. Cite this article Birui Wu, Wenle Lan, Ying Chen, Lifeng Wang, and Guoxiang Liang, Optical Nondestructive Metrology of High-aspect-ratio Micro-holes via Focus-displacement Mapping, Sens. Mater., Vol. 38, No. 6, 2026, p. 3301-3314. |