pp. 219-228
S&M326 Research Paper of Special Issue Published: 1998 Chemically Amplified Deep UV Resists for Micromachining Using Electron Beam Lithography and Dry Etching [PDF] Peter Hudek, Ivaylo W. Rangelow, Ivan Kostic, Günther Stangl, Piotr B. Grabiec, Emil W. Rangelow, Miro Belov and Feng Shi Cite this article Peter Hudek, Ivaylo W. Rangelow, Ivan Kostic, Günther Stangl, Piotr B. Grabiec, Emil W. Rangelow, Miro Belov and Feng Shi, Chemically Amplified Deep UV Resists for Micromachining Using Electron Beam Lithography and Dry Etching, Sens. Mater., Vol. 10, No. 4, 1998, p. 219-228. |