pp. 315-324
S&M452 Research Paper of Special Issue Published: 2001 Realistic Step Flow Model for Orientation-Dependent Wet Etching Implemented in a Modular TCAD Environment [PDF] Anton Horn, Franz Wittmann and Gerhard Wachutka Cite this article Anton Horn, Franz Wittmann and Gerhard Wachutka, Realistic Step Flow Model for Orientation-Dependent Wet Etching Implemented in a Modular TCAD Environment, Sens. Mater., Vol. 13, No. 6, 2001, p. 315-324. |