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Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials
is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
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Sensors and Materials
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is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
Instructions to authors
English 日本語
Instructions for manuscript preparation
English 日本語
Template
English
Publisher
MYU K.K.
Sensors and Materials
1-23-3-303 Sendagi,
Bunkyo-ku, Tokyo 113-0022, Japan
Tel: 81-3-3827-8549
Fax: 81-3-3827-8547
MYU Research, a scientific publisher, seeks a native English-speaking proofreader with a scientific background. B.Sc. or higher degree is desirable. In-office position; work hours negotiable. Call 03-3827-8549 for further information.
MYU Research
(proofreading and recording)
MYU K.K.
(translation service)
The Art of Writing Scientific Papers
(How to write scientific papers)
(Japanese Only)
Sensors and Materials, Volume 15, Number 2 (2003)
Copyright(C) MYU K.K.
Copyright(C) MYU K.K.
|
pp. 67-81
S&M510 Research Paper of Special Issue Published: 2003 Modelling of Anisotropic Etching of Silicon: Anomalies due to Facet Boundary Effects [PDF] Ziyad Elalamy, Leslie M. Landsberger, Mojtaba Kahrizi, Anand Pandy, Irina Stateikina and Sébastien Michel (Received September 30, 2002; Accepted February 21, 2003) Keywords: anisotropic etching of silicon, crystal-based modelling anomalies
In the crystal-based modelling of wet anisotropic etching of silicon, one begins with the hypothesis that the etch rate in a specific etchant composition at a given temperature should depend only on the crystal features of the surface exposed to the etchant. However, analysis of experimental data reveals interesting features which contradict this hypothesis. A given crystal surface having particular crystal indices, under a particular set of etchant conditions (composition, temperature), may exhibit significant differences in etch rate. These anomalies are hypothesized to be driven by effects due to the boundaries of the under-etched facets.
Corresponding author: Sébastien Michel Cite this article Ziyad Elalamy, Leslie M. Landsberger, Mojtaba Kahrizi, Anand Pandy, Irina Stateikina and Sébastien Michel, Modelling of Anisotropic Etching of Silicon: Anomalies due to Facet Boundary Effects, Sens. Mater., Vol. 15, No. 2, 2003, p. 67-81. |
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