pp. 13-19
S&M1152 Research Paper https://doi.org/10.18494/SAM.2016.1194 Published: January 21, 2016 Variable-Dynamic-Range Complementary Metal–Oxide–Semiconductor Image Sensor with Gate/Body-Tied Metal Oxide Silicon Field Effect Transistor-Type Photodetector Using Feedback Structure [PDF] Myunghan Bae, Sung-Hyun Jo, Byung-Soo Choi, Hee Ho Lee, Pyung Choi, and Jang-Kyoo Shin (Received March 30, 2015; Accepted September 7, 2015) Keywords: CMOS image sensor, gate/body-tied PMOSFET, dynamic range, feedback structure
In this paper, a new pixel structure for wide-dynamic-range imaging applications is proposed using a feedback mechanism. The pixel is based on a 3-transistor (3-Tr) active pixel sensor (APS) with a gate/body-tied (GBT) p-channel metal–oxide–silicon field-effect transistor (PMOSFET)-based photodetector. The proposed APS is designed and fabricated using a 0.35 µm 2-poly 4-metal standard complementary metal–oxide–semiconductor (CMOS) technology, and its characteristics are simulated and measured. The pixel consists of a conventional 3-Tr APS with a GBT photodetector and an additional NMOSFET switch. The GBT photodetector is formed using a PMOSFET with a floating gate connected to an n-well and a transfer gate. The new pixel has a tunable dynamic range achieved by adjusting the applied reference voltage level and its duration. Although the pixel size is increased by 69%, the dynamic range is significantly extended to a maximum of 360% by feedback of the output voltage of each pixel.
Corresponding author: Jang-Kyoo ShinCite this article Myunghan Bae, Sung-Hyun Jo, Byung-Soo Choi, Hee Ho Lee, Pyung Choi, and Jang-Kyoo Shin, Variable-Dynamic-Range Complementary Metal–Oxide–Semiconductor Image Sensor with Gate/Body-Tied Metal Oxide Silicon Field Effect Transistor-Type Photodetector Using Feedback Structure, Sens. Mater., Vol. 28, No. 1, 2016, p. 13-19. |