pp. 1567-1576
S&M2202 Research Paper https://doi.org/10.18494/SAM.2020.2732 Published: April 30, 2020 Waveguide-mode Sensor Chip with Si/SiO2/SiOx Structure [PDF] Masato Yasuura, Koji Ueno, Hiroki Ashiba, Yuki Nakaya, and Makoto Fujimaki (Received December 12, 2019; Accepted March 5, 2020) Keywords: microcrystalline silicon, near-field light enhancement, sputtering deposition, transfer matrix method, refractive index measurement
A waveguide-mode sensor detects changes in the complex refractive index on the surface
of a planar waveguide chip with high sensitivity. We developed a waveguide-mode sensor chip
with the Si/SiO2 structure. It was predicted from simulations that a third layer of high refractive
index added to the outermost surface of the planar waveguide may improve the sensitivity of
the waveguide-mode sensor. In this research, we designed and manufactured a borosilicate
glass substrate chip with a Si/SiO2/SiOx structure via sputtering deposition, and we improved
the sensitivity of the waveguide-mode sensor chip. The Si/SiO2/SiOx structure chip was
approximately 1.5 times more sensitive to refractive index changes than the Si/SiO2 structure
chip.
Corresponding author: Masato YasuuraThis work is licensed under a Creative Commons Attribution 4.0 International License. Cite this article Masato Yasuura, Koji Ueno, Hiroki Ashiba, Yuki Nakaya, and Makoto Fujimaki, Waveguide-mode Sensor Chip with Si/SiO2/SiOx Structure, Sens. Mater., Vol. 32, No. 4, 2020, p. 1567-1576. |