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Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
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Sensors and Materials
is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
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Sensors and Materials
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is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.
Instructions to authors
English 日本語
Instructions for manuscript preparation
English 日本語
Template
English
Publisher
MYU K.K.
Sensors and Materials
1-23-3-303 Sendagi,
Bunkyo-ku, Tokyo 113-0022, Japan
Tel: 81-3-3827-8549
Fax: 81-3-3827-8547
MYU Research, a scientific publisher, seeks a native English-speaking proofreader with a scientific background. B.Sc. or higher degree is desirable. In-office position; work hours negotiable. Call 03-3827-8549 for further information.
MYU Research
(proofreading and recording)
MYU K.K.
(translation service)
The Art of Writing Scientific Papers
(How to write scientific papers)
(Japanese Only)
Sensors and Materials, Volume 36, Number 1(2) (2024)
Copyright(C) MYU K.K.
Copyright(C) MYU K.K.
|
pp. 269-276
S&M3517 Research Paper of Special Issue https://doi.org/10.18494/SAM4703 Published: January 26, 2024 Characterization of Plasma-etched Surfaces of TlBr Crystals for Radiation Detectors [PDF] Taro Nojima, Mitsuhiro Nogami, Toshiyuki Onodera, and Keitaro Hitomi (Received October 18, 2023; Accepted January 5, 2024) Keywords: TlBr semiconductor detector, plasma etching, X-ray photoelectron spectroscopy (XPS)
The changes in thallium bromide (TlBr) surfaces induced by plasma etching were characterized by X-ray photoelectron spectroscopy (XPS). A TlBr crystal was grown by the traveling molten zone method with zone-purified material. TlBr wafers were obtained from the crystal. Ar plasma etching was performed on the TlBr wafers. XPS revealed that Tl metal (Tl0) was created in TlBr by the plasma etching. The Tl0 concentration increased with the irradiation time of the plasma. The net Tl0 concentrations of TlBr wafers etched by the plasma for 45 and 180 s were 0.7 and 2.6 wt%, respectively.
Corresponding author: Taro Nojima  This work is licensed under a Creative Commons Attribution 4.0 International License. Cite this article Taro Nojima, Mitsuhiro Nogami, Toshiyuki Onodera, and Keitaro Hitomi, Characterization of Plasma-etched Surfaces of TlBr Crystals for Radiation Detectors, Sens. Mater., Vol. 36, No. 1, 2024, p. 269-276. |
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