pp. 125-130
S&M636 Research Paper of Special Issue Published: 2006 Fabrication of Silicon Master Using Dry and Wet Etching for Optical Waveguide by Thermal Embossing Technique [PDF] Jung-Hun Kim, Yu-Min Jung, Yu-Jeong Cho, Jong-Wan Kim, Yeong-Cheol Kim, Hwa-Il Seo, Kyung-Hwan Kim and Makoto Ishida (Received February 27, 2006; Accepted March 13, 2006) Keywords: optical waveguide, master, DRIE, wet etching, PFAS, HYBRIMER
Masters for the fabrication of planar optical waveguides were fabricated from (100) silicon wafers. Deep reactive ion etching (DRIE) and wet chemical etching were used to form smooth rectangular patterns on the masters. The roughness of the etched patterns was small enough to fabricate planar optical waveguides. The treatment of a master surface with oxide and perfluoalkylsilane (PFAS) improved further the separation of the master and the substrate. The materials that were used as underclad and core layers were organicinorganic hybrids called as-hybrid materials (HYBRIMERs). We successfully replicated the waveguides with the fabricated masters.
Corresponding author: Hwa-Il SeoCite this article Jung-Hun Kim, Yu-Min Jung, Yu-Jeong Cho, Jong-Wan Kim, Yeong-Cheol Kim, Hwa-Il Seo, Kyung-Hwan Kim and Makoto Ishida, Fabrication of Silicon Master Using Dry and Wet Etching for Optical Waveguide by Thermal Embossing Technique, Sens. Mater., Vol. 18, No. 3, 2006, p. 125-130. |