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Notice of retraction
Vol. 34, No. 8(3), S&M3042

Notice of retraction
Vol. 32, No. 8(2), S&M2292

Print: ISSN 0914-4935
Online: ISSN 2435-0869
Sensors and Materials
is an international peer-reviewed open access journal to provide a forum for researchers working in multidisciplinary fields of sensing technology.
Sensors and Materials
is covered by Science Citation Index Expanded (Clarivate Analytics), Scopus (Elsevier), and other databases.

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Sensors and Materials, Volume 18, Number 3 (2006)
Copyright(C) MYU K.K.
pp. 125-130
S&M636 Research Paper of Special Issue
Published: 2006

Fabrication of Silicon Master Using Dry and Wet Etching for Optical Waveguide by Thermal Embossing Technique [PDF]

Jung-Hun Kim, Yu-Min Jung, Yu-Jeong Cho, Jong-Wan Kim, Yeong-Cheol Kim, Hwa-Il Seo, Kyung-Hwan Kim and Makoto Ishida

(Received February 27, 2006; Accepted March 13, 2006)

Keywords: optical waveguide, master, DRIE, wet etching, PFAS, HYBRIMER

Masters for the fabrication of planar optical waveguides were fabricated from (100) silicon wafers. Deep reactive ion etching (DRIE) and wet chemical etching were used to form smooth rectangular patterns on the masters. The roughness of the etched patterns was small enough to fabricate planar optical waveguides. The treatment of a master surface with oxide and perfluoalkylsilane (PFAS) improved further the separation of the master and the substrate. The materials that were used as underclad and core layers were organicinorganic hybrids called as-hybrid materials (HYBRIMERs). We successfully replicated the waveguides with the fabricated masters.

Corresponding author: Hwa-Il Seo


Cite this article
Jung-Hun Kim, Yu-Min Jung, Yu-Jeong Cho, Jong-Wan Kim, Yeong-Cheol Kim, Hwa-Il Seo, Kyung-Hwan Kim and Makoto Ishida, Fabrication of Silicon Master Using Dry and Wet Etching for Optical Waveguide by Thermal Embossing Technique, Sens. Mater., Vol. 18, No. 3, 2006, p. 125-130.



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