pp. 1023-1033
S&M1264 Research Paper of Special Issue https://doi.org/10.18494/SAM.2016.1391 Published: September 21, 2016 Charge Retention Improvement of Nonvolatile Radiation Sensor Using Metal–Oxide–Nitride–Oxide–Silicon with Si-Rich Nitride and Oxy-Nitride as Stack Charge-Trapping Layer [PDF] Wen-Ching Hsieh, Hao-Tien Daniel Lee, Fuh-Cheng Jong,and Shich-Chuan Wu (Received December 28, 2015; Accepted June 10, 2016) Keywords: high k, sensor, SONOS, MOS, radiation
Metal–oxide–nitride–oxide–silicon devices with Si-rich nitride and oxy-nitride as a bi-layerstack charge-trapping layer (hereafter STOB-MONOS) could be candidates for nonvolatile totalionizing dose (TID) radiation sensors. In the case of STOB-MONOS nonvolatile TID radiationsensors, gamma radiation induces a significant decrease in the threshold voltage VT, which is nearly 2 times larger than that of a standard MONOS device. The change in VT for STOB-MONOSafter gamma irradiation also has a strong correlation to TID up to 10 Mrad gamma irradiation.The reliability characteristics of VT retention time before and after gamma irradiation for STOBMONOSdevices can be markedly improved and is nearly 12% better than that of a standardMONOS device. The STOB-MONOS device in this study has demonstrated the possibility ofimproved the feasibility of non-volatile high TID radiation sensing.
Corresponding author: Wen-Ching HsiehCite this article Wen-Ching Hsieh, Hao-Tien Daniel Lee, Fuh-Cheng Jong,and Shich-Chuan Wu, Charge Retention Improvement of Nonvolatile Radiation Sensor Using Metal–Oxide–Nitride–Oxide–Silicon with Si-Rich Nitride and Oxy-Nitride as Stack Charge-Trapping Layer, Sens. Mater., Vol. 28, No. 9, 2016, p. 1023-1033. |