pp. 2291-2301
S&M1932 Research Paper of Special Issue https://doi.org/10.18494/SAM.2019.2317 Published in advance: April 9, 2019 Published: July 19, 2019 Direct Formation of Solution-based Al2O3 on Epitaxial Graphene Surface for Sensor Applications [PDF] Kwan-Soo Kim, Hirokazu Fukidome, and Maki Suemitsu (Received January 31, 2019; Accepted February 25, 2019) Keywords: epitaxial graphene, solution process, sensor, microwave annealing
We propose a method for fabricating high-performance epitaxial graphene field-effect transistors (EG-FETs), involving a microwave-annealing-treated solution-based Al2O3 (MWA-treated sol-Al2O3) layer as a gate dielectric. The MWA process substantially preserves the pristine properties of EG with minimal hole doping and strain induction. The MWA-treated sol-Al2O3 showed a surface roughness of ~0.33 nm, a dielectric constant of 7.5, and a leakage current of 8.7 × 10−6 A/cm2. The transconductance of the MWA-based EG-FET presents an enhanced field effect mobility by a factor of about 8 compared with the EG-FET with a natural oxide of Al.
Corresponding author: Kwan-Soo KimThis work is licensed under a Creative Commons Attribution 4.0 International License. Cite this article Kwan-Soo Kim, Hirokazu Fukidome, and Maki Suemitsu, Direct Formation of Solution-based Al2O3 on Epitaxial Graphene Surface for Sensor Applications, Sens. Mater., Vol. 31, No. 7, 2019, p. 2291-2301. |