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Vol. 32, No. 8(2), S&M2292

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Sensors and Materials, Volume 37, Number 3(2) (2025)
Copyright(C) MYU K.K.
pp. 977-985
S&M3970 Research Paper
https://doi.org/10.18494/SAM5547
Published: March 14, 2025

Sub-micrometer-sized Patterning of Photoresist by Electron Beam Projection Lithography Using Tabletop Scanning Electron Microscopy System and Stencil Masks [PDF]

Mina Sato, Mie Tohnishi, Miho Fujimoto, and Akihiro Matsutani

(Received January 15, 2025; Accepted March 5, 2025)

Keywords: EPL, stencil masks, tabletop SEM, lithography, Si

We demonstrated a lithography technique using stencil masks and a tabletop scanning electron microscopy (SEM) system by applying electron beam projection lithography (EPL) technology. Si and Pt were used as stencil mask materials. Si has excellent fabrication workability, and Pt has excellent electron shielding. The lithography was performed at an incident electron energy of 5 to 10 kV, which is typically used in the tabletop SEM system. This technique achieves high throughput and can expose large areas at once. Sub-micrometer- and micrometer-sized patterns can be formed simultaneously.

Corresponding author: Mina Sato


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Cite this article
Mina Sato, Mie Tohnishi, Miho Fujimoto, and Akihiro Matsutani, Sub-micrometer-sized Patterning of Photoresist by Electron Beam Projection Lithography Using Tabletop Scanning Electron Microscopy System and Stencil Masks, Sens. Mater., Vol. 37, No. 3, 2025, p. 977-985.

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