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pp. 2613-2620
S&M4457 Research paper https://doi.org/10.18494/SAM6103 Published: May 22, 2026 Fabrication and Resistive Switching Characteristics of Sol–Gel-derived SrBi₄Ti₄O₁₅ Memory Devices [PDF] Wen-Lung Lee, Kai-Huang Chen, Ming-Cheng Kao, and Shen-Feng Lin (Received November 30, 2025; Accepted April 10, 2026) Keywords: bipolar switching properties, SrBi₄Ti₄O₁₅ oxide thin film, RRAM, rf sputtering
In this study, SrBi₄Ti₄O₁₅ (SBT) thin films were deposited on TiN/Si substrates by the sol–gel method, forming a metal–insulator–metal (MIM)-structured resistive random access memory (RRAM) device. Subsequently, rapid thermal annealing (RTA) was employed to improve the crystallinity and repair surface defects through lattice reorganization. An aluminum (Al) top electrode was then deposited by physical vapor deposition (PVD) to complete the MIM structure. The surface morphology of the SBT insulating layer was characterized using a field-emission scanning electron microscopy (FE-SEM) system, while the current–voltage (I–V) characteristics were measured using a precision source/measure unit (Keysight B2902A) to investigate the resistive switching behavior and underlying carrier transport mechanisms.
Corresponding author: Wen-Lung Lee and Kai-Huang Chen![]() ![]() This work is licensed under a Creative Commons Attribution 4.0 International License. Cite this article Wen-Lung Lee, Kai-Huang Chen, Ming-Cheng Kao, and Shen-Feng Lin, Fabrication and Resistive Switching Characteristics of Sol–Gel-derived SrBi₄Ti₄O₁₅ Memory Devices, Sens. Mater., Vol. 38, No. 5, 2026, p. 2613-2620. |