pp. 219-227
S&M915 Research Paper of Special Issue https://doi.org/10.18494/SAM.2013.881 Published: March 28, 2013 Evaluation of GaN Substrate for Vertical GaN Power Device Applications [PDF] Tetsu Kachi and Tsutomu Uesugi (Received November 2, 2012; Accepted December 19, 2012) Keywords: GaN substrate, Na flux method, vertical power device, leakage current, dislocation
Pn diodes were fabricated on a GaN substrate prepared by the Na flux method. Edge and mix dislocations that developed from the GaN substrate were observed in the diodes. These threading dislocations did not induce leakage current even when the dislocation density was in the range of 105–106 cm–2. These results indicate that a GaN substrate that does not include pure screw dislocations will be applicable to vertical power devices.
Corresponding author: Tetsu KachiCite this article Tetsu Kachi and Tsutomu Uesugi, Evaluation of GaN Substrate for Vertical GaN Power Device Applications, Sens. Mater., Vol. 25, No. 3, 2013, p. 219-227. |